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Приготовление тонких пленок Ga2O3 золь-гель методом — краткий обзор
Авторы
X. Zhang 1 , В.А. Спиридонов 1 , Д.Ю. Панов 1 , И.М. Соснин 2, 1 , А.Е. Романов 2, 1, 31 Институт перспективных систем передачи данных, Университет ИТМО, Кронверкский пр. 49а, 197101 Санкт-Петербург, Россия
2 Тольяттинский государственный университет, Белорусская ул., д. 14, Тольятти, 445020, Россия
3 Физико-технический институт им. А.Ф. Иоффе, Политехническая ул., д. 26, Санкт-Петербург, 194021, Россия
Аннотация
В настоящее время оксид галлия (Ga2O3) как широкозонный полупроводниковый материал привлекает все большее внимание в различных практических областях. В связи с этим было предпринято много усилий по изготовлению и исследованию его объемного кристалла, тонких пленок и нанопроволок. Для пленок Ga2O3 существует множество методов подготовки, таких как осаждение металлорганических соединений из газообразной фазы, хлорид-гидридная газофазная эпитаксия, импульсное лазерное напыление, молекулярно-пучковая эпитаксия, радиочастотное магнетронное напыление, атомно-слоевое осаждение, мокрая химия и золь-гель. Этот краткий обзор посвящен приготовлению тонких пленок Ga2O3 золь-гель методами. Золь-гель методы включают нанесение покрытия погружением, центрифугирование, спрей-пиролиз и метод капельного литья. В работе обобщены и проанализированы детали изготовления тонких пленок β-Ga2O3 золь-гель методом. Обсуждаются полиморфизм, структура и свойства полученных методом золь-гель пленок Ga2O3.
Ключевые слова
золь-гель; Ga2O3; тонкая пленкаФинансирование
Министерство науки и высшего образования Российской Федерации: соглашение № 075-15-2021-1349
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